Journal articlePublished
Optimizing Josephson Junction Reproducibility in 30 kV E-Beam Lithography: An Analysis of Backscattered Electron Distribution
J.P.Sinnecker; Rebello, A. C. M.; RUELA, LUCAS M.; MORETO, GUSTAVO; Naiara Yohanna Klein; MARTINS, ELDUES; I. S. Oliveira; ROUXINOL, FRANCISCO
783 -
Publication details
- Authors
- J.P.Sinnecker; Rebello, A. C. M.; RUELA, LUCAS M.; MORETO, GUSTAVO; Naiara Yohanna Klein; MARTINS, ELDUES; I. S. Oliveira; ROUXINOL, FRANCISCO
- Type
- Journal article
- Status
- Published
- Publication date
- 08/08/2024
- Journal
- Nanomaterials
- Volume
- 14
- Year
- 2024
- Pages
- 783 -
- DOI
- http://dx.doi.org/10.3390/nano14090783
- Scope
- International
- Indexed in the Science Citation Index
- Yes
- Linked to a thesis
- No
- Linked to a grant
- No